Properties of Hafnium and Aluminium Silicates Coatings Obtained by PLD

We report on the deposition and characterization of hafnium silicate aluminium thin films for different applications in optics electronics. Pulsed laser a controllable oxygen atmosphere was used as processing technique, with optimized parameters terms wavelength, fluence pressure. The were investigated using atomic force microscopy, spectroscopic ellipsometry, UV–VIS spectroscopy X-ray photoelectron spectroscopy. morphological investigations evidenced uniform layers low roughness (in order nanometres). optical revealed that absorption infrared (IR) range can be obtained at high substrate temperatures (600 °C). behaviour respect to nanosecond IR irradiation have higher laser-induced damage threshold values comparison silicate.